作者: J. Xie, A. Kar,
期刊: Journal of Applied Physics (AIP Available online 1997) 卷期: Volume 82, issue 10
页码: 4744-4751
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.366330
出版商: AIP
数据来源: AIP
摘要:
Large-area film removal with lasers is a physical process of melting and vaporization of films. A mathematical model is developed to simulate the melting and vaporization of films under the irradiation of a chemical oxygen–iodine laser. The cross section of the film after laser scanning and the substrate surface temperature during laser irradiation are presented. There is an optimum laser power at which relatively wide films can be removed by maintaining low temperature at the substrate surface. The optimum laser power is associated with other process parameters. The results of film removal withTEM31andTEM00beams are compared, and the laser mode with more uniform intensity distribution is found to be more effective for large-area film removal. ©1997 American Institute of Physics.
点击下载: PDF (215KB)
返 回
版权所有 © 2009 NSTL国家科技图书文献中心
咨询热线:800-990-8900 010-58882057 Email:service@nstl.gov.cn
地址:北京市复兴路15号 100038 京ICP备05017586号