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A model for silicon‐oxide breakdown under high field and current stress

 

作者: E. Avni,   J. Shappir,  

 

期刊: Journal of Applied Physics  (AIP Available online 1988)
卷期: Volume 64, issue 2  

页码: 743-748

 

ISSN:0021-8979

 

年代: 1988

 

DOI:10.1063/1.342477

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A recently developed self‐consistent model for gate‐oxide degradation due to charge injection, described in a companion paper, is expanded to include electrical ‘‘wear out’’ breakdown. In the present work, gate‐oxide breakdown is defined to occur when the density of generated neutral trapping sites reaches a critical threshold value at the anode. Breakdown experimental results obtained under constant tunneling current are treated and simulated. The new model deals successfully with oxide breakdown dependence on: injection history, gate‐oxide thickness, charge‐injection current density, injection polarity reversal, gate electrode material, and oxide anneal temperatures.

 

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