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Arrhenius-like behavior in plasma reactions

 

作者: N. Spiliopoulos,   D. Mataras,   D. E. Rapakoulias,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 71, issue 5  

页码: 605-607

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.119807

 

出版商: AIP

 

数据来源: AIP

 

摘要:

An Arrhenius-like behavior of the silane dissociation rate constant as a function of the power actually fed in a rf discharge system is reported. The rate constant is calculated using mass-spectrometric measurements of silane consumption for 50 and 75 mTorr discharges, while the power consumed in the discharge is determined by using detailed voltage and current measurements. The slope of the natural logarithm of the dissociation rate constant as a function of the inverse of the discharge power increases with pressure. This is attributed to a change in the shape and/or the mean energy of the electron energy distribution function, while the linearity indicates an analogous increase of the active electron concentration with increasing discharge power, excluding a significant change in the shape of the electron energy distribution function. ©1997 American Institute of Physics.

 

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