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Yield stress increase in electron irradiated copper

 

作者: Kanji Ono,   T. Mifune,   M. Meshii,  

 

期刊: Philosophical Magazine  （Taylor Available online 1968）
卷期: Volume 17, issue 146  

页码: 235-240

 

ISSN:0031-8086

 

年代: 1968

 

DOI:10.1080/14786436808226158

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

This paper reports the effect of 2 Mev electron irradiation below 31°K on the yield stress of copper single crystals measured at 25°K. Irradiation produces a large increase in the yield stress, which is interpreted as dispersed barrier hardening due to interstitials.

 

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