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(ArO)+and (ArO2)+ions in rf sputter deposition discharges

 

作者: Carolyn Rubin Aita,   Robert J. Lad,  

 

期刊: Journal of Applied Physics  (AIP Available online 1986)
卷期: Volume 60, issue 2  

页码: 837-839

 

ISSN:0021-8979

 

年代: 1986

 

DOI:10.1063/1.337384

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Glow discharge mass spectrometry was used to study the occurrence of argon–oxygen ions in rf‐diode sputter deposition discharges. The results show that (ArO)+and (ArO2)+ions are formed over an extensive range of Ar–O2sputtering gas mixtures. The populations of these ions are independent of whether a ZnO or Au target is used and coupled in a manner that indicates (ArO2)+is formed first then dissociates to form (ArO)+. An associative ionization reaction between an Ar atom in a highly excited long‐lived Rydberg state and ground state O2is proposed to be responsible.

 

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