(ArO)+and (ArO2)+ions in rf sputter deposition discharges
作者:
Carolyn Rubin Aita,
Robert J. Lad,
期刊:
Journal of Applied Physics
(AIP Available online 1986)
卷期:
Volume 60,
issue 2
页码: 837-839
ISSN:0021-8979
年代: 1986
DOI:10.1063/1.337384
出版商: AIP
数据来源: AIP
摘要:
Glow discharge mass spectrometry was used to study the occurrence of argon–oxygen ions in rf‐diode sputter deposition discharges. The results show that (ArO)+and (ArO2)+ions are formed over an extensive range of Ar–O2sputtering gas mixtures. The populations of these ions are independent of whether a ZnO or Au target is used and coupled in a manner that indicates (ArO2)+is formed first then dissociates to form (ArO)+. An associative ionization reaction between an Ar atom in a highly excited long‐lived Rydberg state and ground state O2is proposed to be responsible.
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