The uniform deposition of YBa2Cu3O7(YBCO) thin films over an 8‐in.‐diam. area, using a 3‐in.‐diam. sputtering target and optimized substrate rotation in a single target 90° off‐axis sputtering technique, is reported. Two dimensional maps of the thickness profile of YBCO films deposited on a stationary substrate have been obtained using surface profilometry. These thicknesses were used in a computer simulation to predict which distance of the target from the center of the substrate rotation will produce the maximum area with uniform thickness. The films deposited on substrates mounted on a rotating arm displayed uniform thickness (<±5% variation) and composition (<2.3% deviation from the target stoichiometry) and a consistently high transition temperature (Tc>87.5° K) and critical current density (Jc 4.2 K>2×107A/cm2) over an 8‐in.‐diam area. ©1996 American Institute of Physics.