Ion beam impact and penetration of polymethyl methacrylate
作者:
G. M. Mladenov,
M. Braun,
B. Emmoth,
J. P. Biersack,
期刊:
Journal of Applied Physics
(AIP Available online 1985)
卷期:
Volume 58,
issue 7
页码: 2534-2538
ISSN:0021-8979
年代: 1985
DOI:10.1063/1.335932
出版商: AIP
数据来源: AIP
摘要:
Depth distributions of energy dissipation and implantation ranges in the polymer resist polymethyl methacrylate (PMMA) have been calculated by using the TRIM computer code. The relevance of such calculations to experimentally obtained data in connection with ion‐beam lithography is discussed. It is concluded that the result of the computer simulations may be of value in order to explain the responsible mechanism for the modification (solubility, erosion rate) of a resist material due to ion irradiation. Experimental results of PMMA erosion during ion irradiation are also presented, showing a strong relationship between the erosion and electronic stopping.
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