首页   按字顺浏览 期刊浏览 卷期浏览 Defect structure and formation mechanism of drawing‐induced absorption at 630 nm...
Defect structure and formation mechanism of drawing‐induced absorption at 630 nm in silica optical fibers

 

作者: Yoshinori Hibino,   Hiroaki Hanafusa,  

 

期刊: Journal of Applied Physics  (AIP Available online 1986)
卷期: Volume 60, issue 5  

页码: 1797-1801

 

ISSN:0021-8979

 

年代: 1986

 

DOI:10.1063/1.337785

 

出版商: AIP

 

数据来源: AIP

 

摘要:

This paper presents a study on drawing condition dependences of optical absorption at 630 nm and nonbridging oxygen hole centers (NBOHCs) in optical fibers drawn from low‐OH‐content synthetic silica glass. The intensity of the 630‐nm absorption is proportional to the NBOHC concentration, and the value of the oscillator strength for the NBOHC is 4.2×10−4, which nearly equals the theoretical values. These results confirm that the 630‐nm absorption is due to the NBOHCs in low‐OH‐content silica glass. Furthermore, the 630‐nm absorption increases with increasing drawing tension. This drawing tension dependence is explained by applying kinetics of the stress‐induced crack growth in metal to the formation of the NBOHCs in the drawing process.

 

点击下载:  PDF (364KB)



返 回