Improved minority‐carrier lifetime in Si/SiGe heterojunction bipolar transistors grown by molecular beam epitaxy
作者:
G. S. Higashi,
J. C. Bean,
C. Buescher,
R. Yadvish,
H. Temkin,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 56,
issue 25
页码: 2560-2562
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.102886
出版商: AIP
数据来源: AIP
摘要:
Noncontact‐probe photocarrier lifetime measurements have been used to give rapid feedback on minority‐carrier lifetimes of epitaxial Si/SiGe layers grown by molecular beam epitaxy (MBE). In this manner, problems with impurity incorporation during the crystal growth can be rapidly diagnosed in a device‐processing‐independent fashion. These improvements in minority‐carrier lifetime translate directly into high gains in the heterojunction bipolar transistors (HJBTs). HJBT test devices fabricated from the MBE‐grown Si/SiGe layers show current gains as high as 800. The homojunction gain of this device is estimated to be ∼6, making the heterojunction gain on the order of 130.
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