Transport characteristics of polycrystalline‐silicon wire influenced by single‐electron charging at room temperature
作者:
Kazuo Yano,
Tomoyuki Ishii,
Takashi Hashimoto,
Takashi Kobayashi,
Fumio Murai,
Koichi Seki,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 67,
issue 6
页码: 828-830
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.115457
出版商: AIP
数据来源: AIP
摘要:
Conductance of ultrathin polycrystalline silicon wire was measured and periodic plateaus, which provide evidence of the Coulomb staircase at room temperature, are observed. This shows that single‐electron charging effects are important to transport in a semiconductor system at room temperature. The very small (∼10‐nm diam) silicon‐grain structure is presumably playing a key role in creating the observed effects. From the temperature dependence, the electron transport is clearly dominated by the thermal emission, whose activation energy is more than 400 meV. This reveals that the treatment beyond well‐established single‐electron tunneling, including thermal‐emission transfer, is essential to understand such high‐temperature charging effects in semiconductor systems. ©1995 American Institute of Physics.
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