Blister formation in alumina thin films bombarded with xenon ions
作者:
L. Romana,
G. Fuchs,
G. Massouras,
P. Thevenard,
期刊:
Radiation Effects and Defects in Solids
(Taylor Available online 1990)
卷期:
Volume 115,
issue 1-3
页码: 139-143
ISSN:1042-0150
年代: 1990
DOI:10.1080/10420159008220562
出版商: Taylor & Francis Group
关键词: Blister formation;alumina thin films;Xe irradiation;annealing
数据来源: Taylor
摘要:
Blisters have been observed in evaporated alumina thin films after xenon irradiation. The aim of this study is to further understand the mechanisms responsible of such process. Surface blistering dependence on thickness of the alumina films as well as irradiation fluence, temperature and post-irradiation thermal annealing have been investigated. From our experimental results, it has been proved that the substrate-alumina interface is not responsible for blistering. Also, according to the gas pressure model and the lateral compressive stress model the latter seems to be more adequate to explain blister formation.
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