Fabrication of electroplated T gates with 60 nm gate length for pseudomorphic high electron mobility transistor devices
作者:
A. Marten,
H. Schneider,
H. Schweizer,
H. Nickel,
W. Schlapp,
R. Lösch,
H. Dämbkes,
P. Marschall,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1991)
卷期:
Volume 9,
issue 6
页码: 2861-2865
ISSN:1071-1023
年代: 1991
DOI:10.1116/1.585657
出版商: American Vacuum Society
关键词: GALLIUM ARSENIDES;INDIUM ARSENIDES;ELECTROPLATING;CARRIER DENSITY;GATES;FABRICATION;EQUIVALENT CIRCUITS;TRANSISTORS;ELECTRON MOBILITY;LITHOGRAPHY
数据来源: AIP
摘要:
We have fabricated and electrically characterized mm‐wave high electron mobility transistors (HEMTs) on pseudomorphic heterostructure GaAs/InGaAs samples. The T‐ and Γ‐shaped gates were produced using electroplating and a conventional single resist‐layer lift‐off process. High frequency measurements of the same device before and after plating demonstrate the reduction in gate resistance. Direct current and high frequency properties of the HEMTs depend strongly on gate length and gate recess depth. Characterization of parallel conducting layers, low field mobility, and sheet carrier concentration depth profiles were obtained with gated Hall measurements. Best HEMT performance was obtained at a gate length of 60 nm, giving an extrinsic (intrinsic) transconductance of 620 mS/mm (840 mS/mm) and a cutoff frequencyftof 135 GHz.
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