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The influence of channelling on the sputtering yield of polycrystalline copper

 

作者: G.N. Van Wyk,   A.H. Lategan,  

 

期刊: Radiation Effects  (Taylor Available online 1981)
卷期: Volume 58, issue 5  

页码: 139-144

 

ISSN:0033-7579

 

年代: 1981

 

DOI:10.1080/01422448108229077

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

Abstract A simple model is proposed to test the applicability of Sigmund's theory to polycrystalline copper targets. A fixed amount of fortuitous chan = nelling is allowed in the target and the sputtering coefficient is calculated by using a combination of single crystal sputtering theory and Sigmund's for= mula. The results indicate that the effect of channelling is to shift the sputtering maximum to higher energy values than predicted by the amorphous target theory. Furthermore, the form of the sputtering yield-energy curves deviate significantly from the Sigmund sputtering curve.

 

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