首页   按字顺浏览 期刊浏览 卷期浏览 Propagation loss measurements in silicon‐on‐insulator optical waveguides ...
Propagation loss measurements in silicon‐on‐insulator optical waveguides formed by the bond‐and‐etchback process

 

作者: A. F. Evans,   D. G. Hall,   W. P. Maszara,  

 

期刊: Applied Physics Letters  （AIP Available online 1991）
卷期: Volume 59, issue 14  

页码: 1667-1669

 

ISSN:0003-6951

 

年代: 1991

 

DOI:10.1063/1.106262

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We report the results of loss measurements for guided waves in silicon‐on‐insulator (SOI) optical waveguides formed by the bond‐and‐etchback process. Losses as low as 2.6 (2.0) dB/cm were found for the TE0(TM0) mode for wavelength &lgr;=1.319 &mgr;m. Grating coupling into these waveguides is demonstrated and discussed.

 

点击下载:  PDF (350KB)



返 回