MicroRaman spectroscopy has been used to measure stress in diamond with improved precision. Stress was induced by rf sputter deposited tungsten films of 1‐ and 9‐μm thickness. Preliminary data showed a systematic error in the diamond Raman peak position of about 0.05 cm−1/scan, which led to inaccurate and imprecise stress measurement. A new technique, using a reference 5520‐Å krypton line only 10.5 cm−1from the Raman diamond line, results in an order of magnitude increase in measurement precision. Using this calibration, diamond peak position could be measured with a precision of ±0.03 cm−1which corresponds to ±11 MPa of stress. This is an easy and inexpensive means to improve stress measurements in diamond by microRaman spectroscopy.