Laser micromachining with a frequency doubled Nd:YAG laser (532 nm) can replace more complex microlithographic processes for rapid turnaround in the development of prototype application-specific integrated circuits. Plasma polymerization is a rapid, dry, environmentally friendly process that yields crosslinked pinhole-free films. Plasma polymerized films of ethylene and an additional gas [PP(gas/E)] were investigated for their micromachining potential. The deposition rates, molecular structures, physical properties and optical properties of the polymers were characterized. PP(Ar/E), with relatively little oxygen and no nitrogen, with superior substrate adhesion and with no debris generated on laser micromachining was chosen as the optimal laser micromachining film. The PP(Ar/E) coefficient of optical absorption at 532 nm(α532),related to unsaturated group concentration, increased with the ratio of plasma power to ethylene mass flow rate[W/Fm(E)].α532reached an asymptote of 2.9μm−1at highW/Fm(E)and could be enhanced slightly using postpolymerization ultraviolet exposure. The optimum conditions were using Ar/E=1/1 and 75 W to produce a 0.6μmthick film for micromachining at2 J/cm2focused 0.25μmbeneath the surface. The laser pulse in a 1.2μmthick film was not fully developed at2 J/cm2and exhibited rounded corners at4 J/cm2,indicating that multiple low energy pulses would be preferable. A complicated and densely packed pattern with several different pulse sizes in which neighboring holes from pulses in close proximity do not merge was accurately reproduced in PP(Ar/E) using laser micromachining.