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A formula for the calculation of the sputtering yield of polycrystalline materials

 

作者: G.N. Van Wyk,   A.H. Lategan,  

 

期刊: Radiation Effects  (Taylor Available online 1982)
卷期: Volume 68, issue 4  

页码: 107-112

 

ISSN:0033-7579

 

年代: 1982

 

DOI:10.1080/01422448208226917

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

The crystallites in a polycrystalline target are considered to belong to two exclusive subsets. The first subset consists of crystallites with main crystallographic axes within the critical angle for channelling while the second subset consists of crystallites with axes larger than the critical angle for channelling. Single crystal and amorphous sputtering theory is used to calculate the sputtering yield for the different subsets and an average value for polycrystalline targets is determined. This value is shown to differ significantly from the Sigmund value for amorphous targets.

 

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