Fabrication of a two‐dimensional array of nanometer‐scale chromium features on a silicon substrate by laser‐focused atomic deposition is described. Features 13±1 nm high and having a full‐width at half maximum of 80±10 nm are fabricated in a square array with lattice constant 212.78 nm, determined by the laser wavelength. The array covers an area of approximately 100 &mgr;m×200 &mgr;m. Issues associated with laser‐focusing of atoms in a two‐dimensional standing wave are discussed, and potential applications and improvements of the process are mentioned.