Extension of the bi‐epitaxial Josephson junction process to various substrates
作者:
K. Char,
M. S. Colclough,
L. P. Lee,
G. Zaharchuk,
期刊:
Applied Physics Letters
(AIP Available online 1991)
卷期:
Volume 59,
issue 17
页码: 2177-2179
ISSN:0003-6951
年代: 1991
DOI:10.1063/1.106411
出版商: AIP
数据来源: AIP
摘要:
We report an extension of the bi‐epitaxial Josephson junction process that permits the use of a variety of substrate materials and allows junctions to be placed at any level of a multilayer structure. The new materials, SrTiO3, MgO, and CeO2, serve as a base layer, a seed layer, and a buffer layer, respectively, and replace Al2O3, MgO, and SrTiO3in the original bi‐epitaxial process. This new process offers much more flexibility in designing a circuit. Bi‐epitaxial junctions made with the new set of materials show much improved electrical properties, especially at 77 K. We attribute the improved electrical characteristics to a better thermal expansion match between the substrate and the thin‐film layers. Important junction properties such as critical currents and junction resistances are compared to other types of grain boundary junctions.
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