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Refractive indices of In0.49Ga0.51−xAlxP lattice matched to GaAs

 

作者: Hidenao Tanaka,   Yuichi Kawamura,   Hajime Asahi,  

 

期刊: Journal of Applied Physics  (AIP Available online 1986)
卷期: Volume 59, issue 3  

页码: 985-986

 

ISSN:0021-8979

 

年代: 1986

 

DOI:10.1063/1.336581

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The refractive indices of In0.49Ga0.51P, In0.49Al0.51P, and In0.49Ga0.29Al0.22P, lattice matched to GaAs grown by molecular‐beam epitaxy, are determined from double‐beam reflectance measurements for photon energies ranging from 0.6 to 1.3 eV. Variation of the In0.49Ga0.51−xAlxP, refractive index with Al compositionxand photon energy is calculated according to the single‐effective‐oscillator model. These analytical results are then compared with experimental data.

 

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