Refractive indices of In0.49Ga0.51−xAlxP lattice matched to GaAs
作者:
Hidenao Tanaka,
Yuichi Kawamura,
Hajime Asahi,
期刊:
Journal of Applied Physics
(AIP Available online 1986)
卷期:
Volume 59,
issue 3
页码: 985-986
ISSN:0021-8979
年代: 1986
DOI:10.1063/1.336581
出版商: AIP
数据来源: AIP
摘要:
The refractive indices of In0.49Ga0.51P, In0.49Al0.51P, and In0.49Ga0.29Al0.22P, lattice matched to GaAs grown by molecular‐beam epitaxy, are determined from double‐beam reflectance measurements for photon energies ranging from 0.6 to 1.3 eV. Variation of the In0.49Ga0.51−xAlxP, refractive index with Al compositionxand photon energy is calculated according to the single‐effective‐oscillator model. These analytical results are then compared with experimental data.
点击下载:
PDF
(190KB)
返 回