Photoluminescence study of the crossover from two‐dimensional to three‐dimensional growth for Ge on Si(100)
作者:
P. Schittenhelm,
M. Gail,
J. Brunner,
J. F. Nu¨tzel,
G. Abstreiter,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 67,
issue 9
页码: 1292-1294
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.114401
出版商: AIP
数据来源: AIP
摘要:
Narrow Ge layers embedded in Si are investigated using photoluminescence (PL) spectroscopy. With increasing layer thickness a growth mode changeover from two‐dimensional (2D) strained‐layer growth to three dimensional Stranski–Krastanov growth is observed. Additional PL lines that are redshifted with respect to the PL signal of the 2D strained layers are attributed to islands formed by three‐dimensional growth. The occurrence of these new lines is accompanied by a blueshift of the PL of the 2D layers, indicating a strong Ge diffusion from the 2D layers towards the islands. ©1995 American Institute of Physics.
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