Low temperature crystallization of sputtered carbon films
作者:
J. M. Yan˜ez‐Limo´n,
F. Ruiz,
J. Gonza´lez‐Herna´ndez,
B. S. Chao,
S. R. Ovshinsky,
期刊:
Journal of Applied Physics
(AIP Available online 1995)
卷期:
Volume 78,
issue 5
页码: 3015-3019
ISSN:0021-8979
年代: 1995
DOI:10.1063/1.360051
出版商: AIP
数据来源: AIP
摘要:
The crystallization of amorphous carbon films, under inert atmospheres, occurs at annealing temperatures above 800 °C. In this work we have found that when the annealing of carbon films is performed under atmospheric conditions, crystallization occurs at temperatures as low as 200 °C. The catalytic effect of oxygen in the crystallization process is understood in terms of the generation of a porous structure in the carbon film due to the vaporization of carbon oxides. ©1995 American Institute of Physics.
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