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Low temperature crystallization of sputtered carbon films

 

作者: J. M. Yan˜ez‐Limo´n,   F. Ruiz,   J. Gonza´lez‐Herna´ndez,   B. S. Chao,   S. R. Ovshinsky,  

 

期刊: Journal of Applied Physics  (AIP Available online 1995)
卷期: Volume 78, issue 5  

页码: 3015-3019

 

ISSN:0021-8979

 

年代: 1995

 

DOI:10.1063/1.360051

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The crystallization of amorphous carbon films, under inert atmospheres, occurs at annealing temperatures above 800 °C. In this work we have found that when the annealing of carbon films is performed under atmospheric conditions, crystallization occurs at temperatures as low as 200 °C. The catalytic effect of oxygen in the crystallization process is understood in terms of the generation of a porous structure in the carbon film due to the vaporization of carbon oxides. ©1995 American Institute of Physics.

 

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