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Electron beam writing of continuous resist profiles for optical applications

 

作者: J. M. Stauffer,   Y. Oppliger,   P. Regnault,   L. Baraldi,   M. T. Gale,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  （AIP Available online 1992）
卷期: Volume 10, issue 6  

页码: 2526-2529

 

ISSN:1071-1023

 

年代: 1992

 

DOI:10.1116/1.586051

 

出版商: American Vacuum Society

 

关键词: LITHOGRAPHY;ELECTRON BEAMS;SPATIAL RESOLUTION;INTEGRATED OPTICS;GRATINGS;FABRICATION

 

数据来源: AIP

 

摘要:

This article reports on progress in the fabrication by e‐beam lithography of high resolution, continuous‐relief microstructures for integrated optical applications in the visible and near infrared. The microstructures are designed for subsequent replications from an electroformed metal shim by embossing into polymer films on glass. The objective of this work is to fabricate complete integrated optical devices and circuits by low‐cost embossing or casting replication technology.

 

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