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Discretization of curved lines and arbitrary areas for ion and electron beam writing on a nonrectangular grid

 

作者: D. K. de Vries,   A. D. Wieck,   K. Ploog,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  （AIP Available online 1994）
卷期: Volume 12, issue 1  

页码: 14-19

 

ISSN:1071-1023

 

年代: 1994

 

DOI:10.1116/1.587173

 

出版商: American Vacuum Society

 

关键词: SEMICONDUCTOR DEVICES;FABRICATION;ION BEAMS;ELECTRON BEAMS;CURVILINEAR COORDINATES;ALGORITHMS;BEAM OPTICS;CONFIGURATION;LITHOGRAPHY;COMPUTER CODES

 

数据来源: AIP

 

摘要:

A method is presented to discretize almost arbitrary curves and areas on nonrectangular grids. This method can be applied in focused ion and electron beam systems. Distortion of the physical writing grid can be taken into account at the discretization, thus eliminating the need for a correction step afterwards.

 

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