Local stress measurements in laterally oxidizedGaAs/AlxGa1−xAsheterostructures by micro-Raman spectroscopy
作者:
J. P. Landesman,
A. Fiore,
J. Nagle,
V. Berger,
E. Rosencher,
P. Puech,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 17
页码: 2520-2522
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.120420
出版商: AIP
数据来源: AIP
摘要:
Lattice deformation induced in surface GaAs layers by the selective lateral oxidation of buriedAlxGa1−xAslayers was determined from the energy shift of the GaAs phonon line in Raman spectra excited with a focused laser beam. The procedure included a correction for the laser beam induced heating effects. The surface GaAs layer was found under small tensile stress in the oxidized regions of our samples with respect to the unoxidized regions. The deformation is8×10−4and is the same, within experimental error, for heterostructures incorporating pure AlAs layers orAl0.98Ga0.02As.Strong differences in Raman efficiency, as well as in photoluminescence efficiency, were observed for different samples, which are discussed in terms of the GaAs/oxide interface nonradiative recombination efficiency. ©1997 American Institute of Physics.
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