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Local stress measurements in laterally oxidizedGaAs/AlxGa1−xAsheterostructures by micro-Raman spectroscopy

 

作者: J. P. Landesman,   A. Fiore,   J. Nagle,   V. Berger,   E. Rosencher,   P. Puech,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 71, issue 17  

页码: 2520-2522

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.120420

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Lattice deformation induced in surface GaAs layers by the selective lateral oxidation of buriedAlxGa1−xAslayers was determined from the energy shift of the GaAs phonon line in Raman spectra excited with a focused laser beam. The procedure included a correction for the laser beam induced heating effects. The surface GaAs layer was found under small tensile stress in the oxidized regions of our samples with respect to the unoxidized regions. The deformation is8×10−4and is the same, within experimental error, for heterostructures incorporating pure AlAs layers orAl0.98Ga0.02As.Strong differences in Raman efficiency, as well as in photoluminescence efficiency, were observed for different samples, which are discussed in terms of the GaAs/oxide interface nonradiative recombination efficiency. ©1997 American Institute of Physics.

 

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