Characterization of the resolving power of a double multilayer monochromator in the energy range of 600–900 eV
作者:
E. J. Puik,
G. E. van Dorssen,
M. J. van der Wiel,
J. Verhoeven,
G. van der Laan,
H. A. Padmore,
期刊:
Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films
(AIP Available online 1991)
卷期:
Volume 9,
issue 6
页码: 3142-3148
ISSN:0734-2101
年代: 1991
DOI:10.1116/1.577185
出版商: American Vacuum Society
关键词: MULTILAYERS;MONOCHROMATORS;X−RAY EQUIPMENT;SOFT X RADIATION;PHOTOEMISSION;EV RANGE 100−1000;CARBON;NICKEL;SILICON;ENERGY RESOLUTION;COATINGS
数据来源: AIP
摘要:
Two different pairs of x‐ray reflecting multilayer coatings have been tested in a double crystal monochromator configuration. The two pairs consisted of Ni (0.4 nm)–C (1.85 nm) and NiSi (0.4 nm)–C (1.85 nm), both with 225 periods. In order to determine the resolution in the energy range of 600–900 eV, the photoelectron yield of several 3dtransition metal compounds was recorded as well as the throughput around the NiLlines. We found for both pairs a resolving power of 220. Simulations taking into account the angular divergence of the x‐ray beam yield a resolution of 250. The difference with the observed value can be due to the nonhomogeneity of the multilayer coating.
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