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Photoemission capacitance transient spectroscopy ofn‐type GaN

 

作者: W. Go¨tz,   N. M. Johnson,   R. A. Street,   H. Amano,   I. Akasaki,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 66, issue 11  

页码: 1340-1342

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.113235

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Electronic defects inn‐type GaN were characterized by photoemission capacitance transient spectroscopy. Conventional deep level transient spectroscopy is of limited use in semiconductors with wide band gaps (e.g., 3.4 eV for GaN at 300 K) because it utilizes thermal energy for charge emission which restricts the accessible range of bandgap energies to within ∼0.9 eV of either band edge, for practical measurement conditions. For electron photoemission to the conduction band, four deep levels were detected at optical threshold energies of approximately 0.87, 0.97, 1.25, and 1.45 eV. It is suggested that the above photodetected deep levels may participate in the 2.2 eV defect luminescence transitions, which are also demonstrated for our material. ©1995 American Institute of Physics.

 

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