首页   按字顺浏览 期刊浏览 卷期浏览 Nucleation of voids and their growth during electromigration
Nucleation of voids and their growth during electromigration

 

作者: H. Suhl,   P. A. Turner,  

 

期刊: Journal of Applied Physics  （AIP Available online 1973）
卷期: Volume 44, issue 11  

页码: 4891-4895

 

ISSN:0021-8979

 

年代: 1973

 

DOI:10.1063/1.1662058

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The growth and distribution of voids formed by vacancy agglomeration during electromigration is examined. It is demonstrated for the first time that a critical current density must be exceeded for void production.

 

点击下载:  PDF (313KB)



返 回