Chemical removal of contaminants from thin film Bi4Sr3Ca3Cu4O16+xsurfaces
作者:
R. P. Vasquez,
R. M. Housley,
期刊:
Journal of Applied Physics
(AIP Available online 1990)
卷期:
Volume 67,
issue 11
页码: 7141-7144
ISSN:0021-8979
年代: 1990
DOI:10.1063/1.344538
出版商: AIP
数据来源: AIP
摘要:
A solution of Br in absolute ethanol, previously shown to be effective at removing nonsuperconducting species from Y‐Ba‐Cu‐O thin film surfaces, is shown to also be effective in treating Bi‐Sr‐Ca‐Cu‐O thin film surfaces. X‐ray photoelectron spectra obtained after etching are consistent with previously reported results obtained from samples cleaved or scraped in vacuum.
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