首页   按字顺浏览 期刊浏览 卷期浏览 Chemical removal of contaminants from thin film Bi4Sr3Ca3Cu4O16+xsurfaces
Chemical removal of contaminants from thin film Bi4Sr3Ca3Cu4O16+xsurfaces

 

作者: R. P. Vasquez,   R. M. Housley,  

 

期刊: Journal of Applied Physics  (AIP Available online 1990)
卷期: Volume 67, issue 11  

页码: 7141-7144

 

ISSN:0021-8979

 

年代: 1990

 

DOI:10.1063/1.344538

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A solution of Br in absolute ethanol, previously shown to be effective at removing nonsuperconducting species from Y‐Ba‐Cu‐O thin film surfaces, is shown to also be effective in treating Bi‐Sr‐Ca‐Cu‐O thin film surfaces. X‐ray photoelectron spectra obtained after etching are consistent with previously reported results obtained from samples cleaved or scraped in vacuum.

 

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