Hydrogen plasma passivation of InP: Real time ellipsometry monitoring andex situphotoluminescence measurements
作者:
G. Bruno,
M. Losurdo,
P. Capezzuto,
V. Capozzi,
T. Trovato,
G. Perna,
G. F. Lorusso,
期刊:
Applied Physics Letters
(AIP Available online 1996)
卷期:
Volume 69,
issue 5
页码: 685-687
ISSN:0003-6951
年代: 1996
DOI:10.1063/1.117806
出版商: AIP
数据来源: AIP
摘要:
The remote hydrogen plasma passivation of semi‐insulating InP substrates has been investigated byinsituspectroscopic ellipsometry (SE), to characterize the changes of InP morphology, andexsituphotoluminescence (PL) to reveal the passivation effect of nonradiative centers operated by H atoms. The concurrence of the InP native oxide removal without surface damage (phosphorus ablation) and the passivation by H‐atoms results in a remarkable enhancement of the PL intensity. ©1996 American Institute of Physics.
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