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Xenon-sensitized photolysis of hydrogen sulphide and ethane

 

作者: K. Wojciechowski,   A. Pawelec,   M. Foryś,  

 

期刊: Radiation Effects  (Taylor Available online 1983)
卷期: Volume 77, issue 3-4  

页码: 217-236

 

ISSN:0033-7579

 

年代: 1983

 

DOI:10.1080/00337578308228188

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

The xenon-sensitized photolysis of hydrogen sulphide and ethane has been performed. The rate constant of the excitation transfer from the Xe(3P1) resonance state to hydrogen sulphide and ethane has been measured to be 3 × 10−10and 4 × 10−10cm3-molec−1S−1. On the basis of the dependence of the hydrogen quantum yield on the xenon pressure at different hydrogen sulphide and ethane pressures the three-body decay of the Xe(3P1) state with xenon atoms and hydrogen sulphide or ethane taking a part in the process has been experimentally shown to have a rate constant of approximately 1 × 10−28cm6molec−2S−1. Using Collins-Lee theory confirms the reliability of this high value.

 

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