Characterization and modelling of thin-film ferroelectric capacitors using C-V analysis
作者:
Ciaran J. Brennan,
期刊:
Integrated Ferroelectrics
(Taylor Available online 1992)
卷期:
Volume 2,
issue 1-4
页码: 73-82
ISSN:1058-4587
年代: 1992
DOI:10.1080/10584589208215733
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
Advances have been made in the electronic characterization and analysis of thin-film ferroelectric (FE) memory capacitors using capacitance vs. voltage (C-V) measurements. A mathematical model of the small-signal electrical behavior of the FE capacitor has been developed. This analysis shows that the small-signal characteristics of the FE capacitor are largely determined by the space charge concentrations at the ferroelectric to contact interface. These space charge regions have an adverse effect on the permittivity, coercivity and switching characteristics of the ferroelectric capacitor. These results will contribute to improving ferroelectric processing, appraising the quality of ferroelectric devices, and developing device models of the ferroelectric memory capacitors for use in circuit design.
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