Lightweight Si/SiC mirrors of nominal diameter 7.5 cm have been fabricated via a scalable and rapid, chemical vapor deposition (CVD) process to demonstrate the CVD mirror fabrication technology. These mirrors consist of a faceplate of either Si or Si‐coated SiC and a lightweight backstructure made of either Si or SiC. The mirrors were polished to a figure better than 1/5th of a wave at 0.6328 A˚ and a finish of better than 10 A˚ rms. A procedure for fabricating these mirrors is described. The CVD fabrication process is fast and has the potential to yield several mirrors in a few weeks time from a single reactor. The CVD mirror fabrication technology is quite general and can be extended to include mirrors of other ceramic materials such as TiB2and B4C.