Observation of alternating reconstructions of silicon (001) 2×1 and 1×2 using reflection high‐energy electron diffraction during molecular beam epitaxy
作者:
T. Sakamoto,
T. Kawamura,
G. Hashiguchi,
期刊:
Applied Physics Letters
(AIP Available online 1986)
卷期:
Volume 48,
issue 23
页码: 1612-1614
ISSN:0003-6951
年代: 1986
DOI:10.1063/1.96833
出版商: AIP
数据来源: AIP
摘要:
Layer‐by‐layer alternating surface reconstructions of Si(001) 2×1 and 1×2 have been observed for the first time using reflection high‐energy electron diffraction (RHEED) during molecular beam epitaxy. RHEED intensity oscillations of the specular beam and two kinds of reconstruction related spots have been monitored simultaneously. It was found that stable alternating reconstructions can be observed on the surface with a single‐domain 2×1 structure obtained by high‐temperature annealing. One period of the RHEED intensity oscillation observed for the specular beam during the growth corresponds to a monatomic layer or a biatomic layer height depending not only on the electron beam incident azimuth but also the glancing angle.
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