Thermal stability improvement in novolak based resist by synchrotron radiation hardening process
作者:
Rakesh Kumar,
Kiyoshi Fujii,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1991)
卷期:
Volume 9,
issue 5
页码: 2523-2525
ISSN:1071-1023
年代: 1991
DOI:10.1116/1.585685
出版商: American Vacuum Society
关键词: SYNCHROTRON RADIATION;RADIATION HARDENING;LITHOGRAPHY;PHOTORESISTS;TEMPERATURE EFFECTS;STABILIZATION
数据来源: AIP
摘要:
This report describes the synchrotron radiation (SR) flood exposure hardening process to improve the thermal stability in negative working x‐ray resist, based on Novolak resin, an acid generator and a crosslinker. This simple SR flood exposure hardening process renders sub‐half‐micron size images in novolak resist, which are resistant to flow at a higher temperature. Our investigation shows that resist images in SAL601‐ER7 resist remain thermally stable at 300 °C after SR flood exposure treatment. Study with infrared spectroscopy suggests that the activator (triazine) which produces strong acid to induced acid catalyzed condensation reaction in the resist film during lithographic exposure, is further decomposed as a result of the SR flood exposure treatment to catalyze further crosslinking of the melamine crosslinker with the novolak resin, during hardbaking to enhance the resist image thermal stability.
点击下载:
PDF
(343KB)
返 回