X,Y, andZcrystalline cut LiNbO3crystals were implanted by 1.0 MeV F ions with a dose of 1×1015ions/cm.2The virgin and implanted LiNbO3crystals were investigated using the Rutherford backscattering/channeling technique. The obtained minimum yields of virgin crystals were 4%, 8%, and 6% forX‐,Y‐, andZ‐cut LiNbO3crystals, respectively, because of their different arrangements of lattice sites in channeling direction. The measured damage profiles are also influenced by the arrangement of lattice sites in channeling measurements. The damage profiles ofX‐cut LiNbO3crystal induced by 1.0 MeV F+at a fluence range of 1×1014–3×1015ions/cm2have been studied and compared with the Transport of Ions in Matter, version 1990 calculation. It has been found that not only the nuclear energy deposition but also the electronic energy deposition influences the defect production.