Metamorphic InGaAs/InAlAs quantum well structures grown on GaAs substrates for high electron mobility transistor applications
作者:
M. Behet,
K. van der Zanden,
G. Borghs,
A. Behres,
期刊:
Applied Physics Letters
(AIP Available online 1998)
卷期:
Volume 73,
issue 19
页码: 2760-2762
ISSN:0003-6951
年代: 1998
DOI:10.1063/1.122582
出版商: AIP
数据来源: AIP
摘要:
Modulation-dopedIn0.5Ga0.5As/In0.5Al0.5Asquantum well structures grown by molecular beam epitaxy on GaAs substrates using a relaxed AlGaAsSb buffer showed carrier mobilities of8500 cm2/V sfor a sheet concentration of3.5×1012 cm−2at room temperature. The crystallinity of the quaternary buffer layer was verified by x-ray diffractometry. Transistors with0.25×100 &mgr;m2gates demonstrated transconductance values as high as 800 mS/mm. S-parameter measurements revealed a cutoff frequencyfTof 87 GHz and a maximum oscillation frequencyfMAXof 140 GHz (both extrinsic values). ©1998 American Institute of Physics.
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