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Metamorphic InGaAs/InAlAs quantum well structures grown on GaAs substrates for high electron mobility transistor applications

 

作者: M. Behet,   K. van der Zanden,   G. Borghs,   A. Behres,  

 

期刊: Applied Physics Letters  (AIP Available online 1998)
卷期: Volume 73, issue 19  

页码: 2760-2762

 

ISSN:0003-6951

 

年代: 1998

 

DOI:10.1063/1.122582

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Modulation-dopedIn0.5Ga0.5As/In0.5Al0.5Asquantum well structures grown by molecular beam epitaxy on GaAs substrates using a relaxed AlGaAsSb buffer showed carrier mobilities of8500 cm2/V sfor a sheet concentration of3.5×1012 cm−2at room temperature. The crystallinity of the quaternary buffer layer was verified by x-ray diffractometry. Transistors with0.25×100 &mgr;m2gates demonstrated transconductance values as high as 800 mS/mm. S-parameter measurements revealed a cutoff frequencyfTof 87 GHz and a maximum oscillation frequencyfMAXof 140 GHz (both extrinsic values). ©1998 American Institute of Physics. 

 

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