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Lowering the Breakdown Voltage of Siliconp‐nJunctions by Stress

 

作者: A. Goetzberger,   R. H. Finch,  

 

期刊: Journal of Applied Physics  (AIP Available online 1964)
卷期: Volume 35, issue 6  

页码: 1851-1854

 

ISSN:0021-8979

 

年代: 1964

 

DOI:10.1063/1.1713753

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A reversible reduction of breakdown voltage is observed when mechanical stress is applied to siliconp‐njunctions. This effect can best be investigated in junctions exhibiting uniform avalanche breakdown. When uniaxial stress is applied the normalized reduction of breakdown voltage &Dgr;V/VBis proportional to stress, the proportionality constant being of the order of 10−12dyn−1cm2. When stress is applied by means of a flat stylus, &Dgr;V/VBis proportional to the load, when a spherical stylus is used, &Dgr;V/VBis proportional to the cube root of load. It can be shown that the relative current change for a given force is to a first approximation independent of diode area and breakdown voltageVB. It is proposed that the effect is caused by reduction of the energy gap.

 

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