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Modification of the density profile in a toroidal plasma source using a bias electric field

 

作者: B. C. Zhang,   R. C. Cross,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 70, issue 23  

页码: 3090-3092

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.119100

 

出版商: AIP

 

数据来源: AIP

 

摘要:

As in other plasma devices with a curved magnetic field geometry, an asymmetric density profile is observed in the PLADEPUS, a toroidal plasma source, at the University of Sydney. In this letter, we demonstrate that the asymmetric density profile can be improved by means of a positive bias electric field at the edge of the plasma. With the bias field, the density profile becomes symmetric and broadened, and the plasma density is enhanced. ©1997 American Institute of Physics.

 

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