Modification of the density profile in a toroidal plasma source using a bias electric field
作者:
B. C. Zhang,
R. C. Cross,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 70,
issue 23
页码: 3090-3092
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.119100
出版商: AIP
数据来源: AIP
摘要:
As in other plasma devices with a curved magnetic field geometry, an asymmetric density profile is observed in the PLADEPUS, a toroidal plasma source, at the University of Sydney. In this letter, we demonstrate that the asymmetric density profile can be improved by means of a positive bias electric field at the edge of the plasma. With the bias field, the density profile becomes symmetric and broadened, and the plasma density is enhanced. ©1997 American Institute of Physics.
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