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Defect states inp‐type silicon crystals induced by plastic deformation

 

作者: Haruhiko Ono,   Koji Sumino,  

 

期刊: Journal of Applied Physics  (AIP Available online 1985)
卷期: Volume 57, issue 2  

页码: 287-292

 

ISSN:0021-8979

 

年代: 1985

 

DOI:10.1063/1.334802

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Deep defect states inp‐type silicon crystals induced by plastic deformation at 750 °C are investigated by means of deep level transient spectroscopy. Several kinds of hole traps having different energy levels within the band gap are introduced simultaneously by deformation. The main three are denoted DH(0.24), DH(0.33), and DH(0.56). The hole concentration versus temperature relations in plastically deformedp‐type silicon crystals measured in a previous paper are interpreted in terms of the defect levels found in this work. Annealing behaviors of the defect states are followed and are compared with those induced by electron irradiation. DH(0.33) is proposed to be due to jogs and kinks while DH(0.24) and DH(0.56) to agglomerations of point defects that result from dislocation debris.

 

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