Field drift and hydrogenation of deep level defects associated with 1‐MeV ion‐implanted oxygen in germanium diodes
作者:
A. J. Tavendale,
S. J. Pearton,
期刊:
Journal of Applied Physics
(AIP Available online 1983)
卷期:
Volume 54,
issue 6
页码: 3213-3215
ISSN:0021-8979
年代: 1983
DOI:10.1063/1.332482
出版商: AIP
数据来源: AIP
摘要:
Deep level hole‐(Ev+0.39 eV) and electron‐trapping (Ec−0.34 eV) centers associated with oxygen ion implanted at 1 MeV (1014ions cm−2) have been detected in Schottky barrier germanium diodes by deep level transient spectroscopy, following thermal anneals under molecular hydrogen. No traps were present after heating under atomic hydrogen from a radiofrequency induced plasma, indicating passivation by hydrogenation. Drift of the peaked, electron trap distribution formed at the projected ion range was observed across the depletion layer of a reverse biased Schottky diode with an average mobility of 5.5±1×10−15cm2 V−1 s−1at 25 °C.
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