首页   按字顺浏览 期刊浏览 卷期浏览 Field drift and hydrogenation of deep level defects associated with 1‐MeV ion&hy...
Field drift and hydrogenation of deep level defects associated with 1‐MeV ion‐implanted oxygen in germanium diodes

 

作者: A. J. Tavendale,   S. J. Pearton,  

 

期刊: Journal of Applied Physics  (AIP Available online 1983)
卷期: Volume 54, issue 6  

页码: 3213-3215

 

ISSN:0021-8979

 

年代: 1983

 

DOI:10.1063/1.332482

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Deep level hole‐(Ev+0.39 eV) and electron‐trapping (Ec−0.34 eV) centers associated with oxygen ion implanted at 1 MeV (1014ions cm−2) have been detected in Schottky barrier germanium diodes by deep level transient spectroscopy, following thermal anneals under molecular hydrogen. No traps were present after heating under atomic hydrogen from a radiofrequency induced plasma, indicating passivation by hydrogenation. Drift of the peaked, electron trap distribution formed at the projected ion range was observed across the depletion layer of a reverse biased Schottky diode with an average mobility of 5.5±1×10−15cm2 V−1 s−1at 25 °C.

 

点击下载:  PDF (247KB)



返 回