Three achromatic deflectors intended for ion lithography are proposed, in which the beam is incident perpendicular to the target. One of these deflectors uses mixed electrostatic and magnetostatic fields, thereby exhibiting mass dependent deflection. Although this is not favorable for a deflector, this setup works well as an achromatic mass filter. Best performance is obtained using a pre‐lens deflector using one lens as a corrector. A two lens corrector has theoretically even better performance, but mechanical and electrical tolerances will probably inhibit good performance.