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Electronic structure of nanometer‐thickness Si(001) film

 

作者: V. I. Gavrilenko,   F. Koch,  

 

期刊: Journal of Applied Physics  (AIP Available online 1995)
卷期: Volume 77, issue 7  

页码: 3288-3294

 

ISSN:0021-8979

 

年代: 1995

 

DOI:10.1063/1.358683

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A tight‐binding calculation of a Si film with nanometer dimensions is presented. We study the electron energy structure and the wave functions of a pristine Si‐quantum film and one covered with hydrogen. A total energy minimization method, in the framework of self‐consistent tight‐binding theory, is used to investigate the reconstruction of the Si‐surface after the adsorption of hydrogen. The dependence of the electron energy spectrum on the film thickness and the atomic structure of the surface is studied. ©1995 American Institute of Physics.

 

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