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The interaction process for Ag‐Al polycrystalline thin‐film couples

 

作者: J. E. E. Baglin,   F. M. d’Heurle,   W.N. Hammer,  

 

期刊: Journal of Applied Physics  (AIP Available online 1979)
卷期: Volume 50, issue 1  

页码: 266-275

 

ISSN:0021-8979

 

年代: 1979

 

DOI:10.1063/1.325710

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The mechanism of the interaction of polycrystalline Ag‐Al thin‐film couples to form Ag2Al at temperatures from 107 to 221 °C has been studied. Techniques of film characterization included Rutherford backscattering, x‐ray diffraction, and SEM. The dependence of the interaction on the grain size of the Ag film (660–7500 A˚) was measured. An effective activation energy of 0.86±0.05 eV was found. The reaction is believed to occur initially by nucleation and growth of Ag2Al grains at Ag grain boundaries at the interface; after formation of a continuous Ag2Al layer, the growth of this layer follows at1/2law, controlled by diffusion through the grain boundaries of the Ag2Al layer.

 

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