(AlAs)1/2(GaAs)1/2fractional‐layer superlattices grown on (001) vicinal GaAs substrates by metal–organic chemical vapor deposition
作者:
Takashi Fukui,
Hisao Saito,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena
(AIP Available online 1988)
卷期:
Volume 6,
issue 4
页码: 1373-1377
ISSN:0734-211X
年代: 1988
DOI:10.1116/1.584224
出版商: American Vacuum Society
关键词: SUPERLATTICES;CHEMICAL VAPOR DEPOSITION;VAPOR DEPOSITED COATINGS;ALUMINIUM ARSENIDES;TRANSMISSION ELECTRON MICROSCOPY;GALLIUM ARSENIDES;FABRICATION;SURFACE STRUCTURE;INTERFACE STRUCTURE;CRYSTAL STRUCTURE;AlAs;GaAs;(Al,Ga)As
数据来源: AIP
摘要:
(AlAs)1/2(GaAs)1/2fractional‐layer superlattices with a new periodicity perpendicular to the growth direction are successfully grown, by metal–organic chemical vapor deposition on (001) GaAs substrates, slightly misoriented towards [1̄10]. The periodic structure in the lateral [1̄10]direction is analyzed by x‐ray superlattice satellite diffraction and high‐resolution transmission electron microscopy(TEM). Superlattice width along [1̄10] direction are exactly the same as the mean distance of each monolayer step on the (001) vicinal surface. The satellite peak intensity increases with increasing AsH3partial pressure, and is stronger for substrates misoriented towards [1̄10] than those misoriented towards [110]. The result can be explained using the lateral growth model, taking into account the dangling bond at the step edge. The superlattice image is clearly observed by TEM, which shows that the superlattice periods are almost uniform everywhere.
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