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Amorphous Phase in Palladium—Silicon Alloys

 

作者: Pol Duwez,   R. H. Willens,   R. C. Crewdson,  

 

期刊: Journal of Applied Physics  (AIP Available online 1965)
卷期: Volume 36, issue 7  

页码: 2267-2269

 

ISSN:0021-8979

 

年代: 1965

 

DOI:10.1063/1.1714461

 

出版商: AIP

 

数据来源: AIP

 

摘要:

By rapid cooling from the melt, an amorphous phase has been obtained in palladium—silicon alloys containing 15 to 23 at.% Si. This phase is stable at room temperature and crystallization cannot be detected after one month at 250°C. With rates of heating greater than 20°C/min, rapid crystallization takes place at 400°C, with a heat release of approximately 1000 cal/mole. The electrical resistivity of an alloy containing 17 at.% Si at room temperature is 2.6 times that of the equilibrium alloy. The resistivity decreases linearly with decreasing temperature and is about 95% of the room‐temperature value at 2°K. Various factors involved in the retention of amorphous phases in rapidly quenched liquid alloys are discussed.

 

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