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Diffusion‐Induced Dislocations in Silicon

 

作者: J. Washburn,   G. Thomas,   H. J. Queisser,  

 

期刊: Journal of Applied Physics  (AIP Available online 1964)
卷期: Volume 35, issue 6  

页码: 1909-1914

 

ISSN:0021-8979

 

年代: 1964

 

DOI:10.1063/1.1713768

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Plastic deformation produced by phosphorus diffusion into a (001) silicon surface has been studied by transmission electron microscopy. The lattice parameter differences in regions of steep solute concentration gradient are accommodated by a crossed grid of edge dislocations having Burgers vectora/2[110] anda/2[1¯10]. The long edge dislocations end at nodes, which suggests that they are formed by dislocation reactions between pairs of dislocations that can glide into the crystal on {111} planes.

 

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