Effects of partial coherence on contact hole projection lithography
作者:
L. K. White,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena
(AIP Available online 1988)
卷期:
Volume 6,
issue 3
页码: 862-865
ISSN:0734-211X
年代: 1988
DOI:10.1116/1.584311
出版商: American Vacuum Society
关键词: RESOLUTION;LENSES;LITHOGRAPHY;ION BEAMS;INTEGRATED CIRCUITS;HOLES
数据来源: AIP
摘要:
Calculated image intensity profiles (IIP’s) are presented for contact holes printed with partial coherence levels in theS=0.5 toS=0.7 range and are compared to IIP’s of the correspondingly dimensioned line–space gratings. Improvements in the depth of focus (DOF) latitude and resolution at higher coherence levels (lower pupil fillS) are quantified for contact hole projection lithography with high‐numerical aperture (NA),g‐line lenses. The relationship between contact and grating DOF is quite complex and changes with the coherence level. Higher pupil fills produce greater differences between the contact and grating DOF. Workable contact hole resolution levels for 0.7, 0.6, and 0.5 pupil fills are estimated to occur atkfactors of 0.89, 0.83, and 0.79, respectively, where thekfactor normalizes feature size to the resolution factor λ/NA of the lens.
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