An inversion procedure for determining a domain wall profile from the associated Lorentz‐microscopy electron‐density distribution is discussed. This procedure is verified by application to computer‐simulated electron‐density distributions derived from assumed wall profiles. The experimental realization of the inversion procedure is demonstrated for high‐resolution Lorentz micrographs of films ranging in thickness from 100 to 500 Å; unreliable profiles were obtained for thicker films. The importance of correcting for the effects of nonmagnetically scattered electrons is emphasized; these effects increase with increasing sample thickness and defocussing distance. The experimental domain wall profiles exhibit first a rapid, then a slow increase of wall angle with distance from the wall center. Wall widths derived from these profiles are consistent with theoretical predictions if corrections are made for nonmagnetic scattering; if such corrections are not made, the large widths reported by other authors are obtained.