Flux distributions in low pressure deposition and etch models

 

作者: T. S. Cale,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  （AIP Available online 1991）
卷期: Volume 9, issue 5  

页码: 2551-2553

 

ISSN:1071-1023

 

年代: 1991

 

DOI:10.1116/1.585691

 

出版商: American Vacuum Society

 

关键词: DEPOSITION;ETCHING;FILMS;SURFACE REACTIONS;GASES;SOLID−FLUID INTERFACES

 

数据来源: AIP

 

 

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